etching process造句
例句与造句
- The results show that amorphous carbon films have high etching resistance against oxygen plasma , and etch rates of the films correlated not only with etching processing parameters , also with deposition conditions
结果表明非晶碳膜对于氧离子体具有高的抗刻蚀性，其刻蚀率不仅与刻蚀的过程参量有关，而且决定于膜的沉积条件。 - In order to fabricate the soi rib waveguides , a reliable and relatively mature process including image reversal lithography , lift - off technique and icp etching process is acquired through a lot of experiments
在制作工艺方面，摸索出一套相对行之有效的soi光波导制作工艺流程，在图像反转光刻以及lift - off金属剥离等方面，得到了一些比较成熟的工艺参数。 - It is very importance to analyze the evolution of microscopic surface features , which impact on the etching surface shape in solid etching process . much theoretical and experimental study point out that the different etching surface shapes by the plasma beam with same energy will be different
随着衍射光学元件的应用和半导体工业的发展，对刻蚀工艺中存在的导致刻蚀表面面形发生各种形变的诸多影响因素的数学分析是一个比较复杂和重要的问题。 - We give some useful analyses and the computer simulations for the ion etching process . compared with the atomic force microscope ( afm ) scanning photograph of the etching surface , the theoretical results prove that these simulation analyses assure the precision required by this problem , so these mathematical models are reasonable and correct . the analysis method in this paper is useful to analyze etching process , and it can also afford some valuable reference to etching technology
在本论文我们主要利用这个数学模型，对使用离子束刻蚀制作单台阶光栅的台阶与沟槽部分的表面面形随时间的演变过程分别进行了计算机模拟分析，并通过把理论结果与在实验中得到的刻蚀表面在原子力显微镜（ afm ）下拍摄的照片进行比较，结果说明这种模拟分析能够保证对该问题分析所要求的精度，从而也证明了理论模型的合理性和正确性。 - A varying - temperature etching method for fiber tip preparing was proposed , with which fiber tips with cone angle as large as 35 - 52 degree could be routinely made . to explore the mechanism of varying - temperature method the changing of the diameter of a fiber during etching process was carefully measured and an experiential formula was found . it reveals that the etching rate of fiber keeps constant until the diameter reduces to a certain amount , which explained the large cone angle obtainable with varying - temperature method
在光纤探针制作方面，本论文提出了一种变温腐蚀制备光纤探针的新方法，获得了35 52度的大锥角光纤探针；进一步对光纤探针腐蚀成形过程进行定量研究，发现当光纤直径腐蚀减小到一定程度以后，腐蚀速度随直径变小而加快；通过对多次实验结果进行拟合，得出了光纤直径随腐蚀时间变化的定量经验公式；借助该经验公式从理论上定量模拟了变温法获得大锥角针尖的过程。 - It's difficult to find etching process in a sentence. 用etching process造句挺难的
- Process parameters related to the film quality are discussed ; relations are found between the etching rate and different process parameters when sio2 and cr thin films are etched in an inductively coupled plaslma ( icp ) etching equipment ; the tmah eroding solution ’ s ph value under different temperatures and concentrations are studied , since the etching process can be controlled by the ph value
3 .初步研究了利用pecvd淀积si3n4薄膜的工艺,讨论了影响薄膜质量的相关工艺参数;初步研究了用icp刻蚀sio2和cr的相关工艺;通过分析不同浓度tmah腐蚀液在不同温度下其ph值的变化,研究了以溶液ph值作为腐蚀溶液的控制参数。 - In order to make integration of theory with practice , a lot of experiments have been done . mask - making technology , photoetching and wet - etching processes have been optimized . the author also presents the application and commercial value of silicon v - groove arrays
在实践上，对制作工艺积极探索，提出新的制备硅掩蔽膜的工艺方案，对影响光刻质量的因素深入分析，试验摸索出适用于v型槽的各向异性湿法腐蚀的腐蚀液配方，独立优化设计了制作硅v型槽的相关工艺，制作出高质量的硅v型槽。 - The stronger combination of fiber and matrix after plasma treatment was discovered . the mechanism of reinforcement of interface combination with plasma treatment was developed as follows : by means of plasma treatment , the wettability of fiber ' s surface was increased , specific area of fiber was enhanced owing to the etching process , the meshing engagement between fiber and matrix was enhanced . with the same parameter ( power , vacuum degree , processing gas ) , the optimum time of plasma treatment is 1 2 minutes
证明了纤维的等离子体处理对纤维与基体的界面结合的提高作用；分析了纤维的等离子体处理增强界面结合的作用机理：一为提高了纤维表面的浸润性；二为对纤维表面的刻蚀作用，增加了纤维的比表面积，同时增强了纤维与基体界面间的机械啮合作用；并得出了在相同处理参数（功率、真空度和工作气体）下等离子体处理的最佳时间为1 2分钟。
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