etching process中文是什么意思

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中文翻译
造句

刻蚀过程

etching n. 1.蚀刻法；蚀刻(铜)版画；蚀镂术。 2.蚀刻画， ...
process vi. 〔口语〕排队走，列队行进〔procession ...
etching process chemical 蚀刻制程化学品
gravure etching process 凹版腐蚀法
etching n. 1.蚀刻法；蚀刻(铜)版画；蚀镂术。 2.蚀刻画，蚀刻版，蚀刻版印刷品。 close [rough] etching (晶体的)精[粗]蚀。 electrochemical etching 电化浸蚀，电抛光。
acid etching 酸蚀处理; 酸蚀刻; 酸性浸蚀
after etching 残余腐蚀; 后腐蚀; 后侵蚀
alkaline etching 碱腐蚀法; 碱侵蚀
anisotropic etching 蛤异性腐蚀; 各向异性刻蚀; 各向异性蚀刻，非等向性蚀刻
anode etching 阳极电解腐蚀
anodic etching 阳极浸蚀法; 阳极侵蚀
arc etching 电弧刻蚀
batch etching 成批腐蚀
bright etching 光亮酸蚀刻
bring etching 光亮蚀刻
calligraphic etching 先用钢笔和墨水在清洁的铜版上画出图形然后蚀刻的方法
cathodic etching 阴极侵蚀; 阴极蚀刻
catodic etching 阴极浸蚀
chemical etching 化学腐蚀法; 化学腐蚀加工; 化学浸蚀; 化学刻蚀; 化学侵蚀法; 化学蚀刻
chemmical etching 化学腐蚀法
clean etching 张条凸版修整腐蚀
clear etching 透明酸蚀刻
close etching 精蚀晶体
closed etching 精蚀
color etching 着色腐蚀

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Observation on the variation of surface morphology during the etching process indicates that the grain boundary and te precipitates will be shown earlier than the dislocations
本文研究了晶片的腐蚀过程，观察随腐蚀程度的逐渐加深，晶片表面缺陷蚀坑形貌的变化。
Via the experiment , the best etching process of etching insb - in material with chclfi plasma is confirmed . and the mechanism is also analyzed and discussed
通过实验确定该条件下chclf _ 2等离子体刻蚀insb - in的最佳工艺，并分析探讨chclf _ 2等离子体刻蚀insb - in薄膜的机理。
We discuss a low cost fabrication method of a diffractive microlens with high performance for both blue and red dvd objective lenses , which consists of single - step photolithography and a wet etching process
摘要采用单步光刻和湿法腐蚀工艺，低成本快速制作面向高性能蓝光和红光dvd光学头物镜的衍射微透镜。
For example , it is challenging for the chemical etching process to drop below a 1 . 5 aspect ratio while , with laser cutting and electroforming , apertures can be produced that have a 1 : 1 aspect ratio to the stencil thickness
比如，表观比率低于1 . 5对于化学腐蚀试一大挑战，而激光切割和电铸可制成表观比率为1 . 1的钢网。
Because the etched pattern will be effected by many factors , many technical difficulties such as getting the ideal etched pattern and monitoring the etching process have not been solved yet
因影响半导体激光诱导液相腐蚀效果的因素很多,要得到理想的腐蚀图样以及监控腐蚀进程有着很大的技术难度,至今没有得到有效解决。
The results show that amorphous carbon films have high etching resistance against oxygen plasma , and etch rates of the films correlated not only with etching processing parameters , also with deposition conditions
结果表明非晶碳膜对于氧离子体具有高的抗刻蚀性，其刻蚀率不仅与刻蚀的过程参量有关，而且决定于膜的沉积条件。
In order to fabricate the soi rib waveguides , a reliable and relatively mature process including image reversal lithography , lift - off technique and icp etching process is acquired through a lot of experiments
在制作工艺方面，摸索出一套相对行之有效的soi光波导制作工艺流程，在图像反转光刻以及lift - off金属剥离等方面，得到了一些比较成熟的工艺参数。
It is very importance to analyze the evolution of microscopic surface features , which impact on the etching surface shape in solid etching process . much theoretical and experimental study point out that the different etching surface shapes by the plasma beam with same energy will be different
随着衍射光学元件的应用和半导体工业的发展，对刻蚀工艺中存在的导致刻蚀表面面形发生各种形变的诸多影响因素的数学分析是一个比较复杂和重要的问题。
We give some useful analyses and the computer simulations for the ion etching process . compared with the atomic force microscope ( afm ) scanning photograph of the etching surface , the theoretical results prove that these simulation analyses assure the precision required by this problem , so these mathematical models are reasonable and correct . the analysis method in this paper is useful to analyze etching process , and it can also afford some valuable reference to etching technology
在本论文我们主要利用这个数学模型，对使用离子束刻蚀制作单台阶光栅的台阶与沟槽部分的表面面形随时间的演变过程分别进行了计算机模拟分析，并通过把理论结果与在实验中得到的刻蚀表面在原子力显微镜（ afm ）下拍摄的照片进行比较，结果说明这种模拟分析能够保证对该问题分析所要求的精度，从而也证明了理论模型的合理性和正确性。
A varying - temperature etching method for fiber tip preparing was proposed , with which fiber tips with cone angle as large as 35 - 52 degree could be routinely made . to explore the mechanism of varying - temperature method the changing of the diameter of a fiber during etching process was carefully measured and an experiential formula was found . it reveals that the etching rate of fiber keeps constant until the diameter reduces to a certain amount , which explained the large cone angle obtainable with varying - temperature method
在光纤探针制作方面，本论文提出了一种变温腐蚀制备光纤探针的新方法，获得了35 52度的大锥角光纤探针；进一步对光纤探针腐蚀成形过程进行定量研究，发现当光纤直径腐蚀减小到一定程度以后，腐蚀速度随直径变小而加快；通过对多次实验结果进行拟合，得出了光纤直径随腐蚀时间变化的定量经验公式；借助该经验公式从理论上定量模拟了变温法获得大锥角针尖的过程。