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etching system中文是什么意思
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- 中文翻译
- 造句
- 蚀刻系统
- etching n. 1.蚀刻法；蚀刻(铜)版画；蚀镂术。 2.蚀刻画， ...
- system n. 1.体系，系统；分类法；组织；设备，装置。 2.方 ...
- bi etching system 双重腐蚀装置
- dry etching system 干式蚀刻系统; 乾式蚀刻系统
- evacuated wet etching system 减压抽气浸渍式蚀刻系统
- helical etching system 螺旋型蚀刻系统
- helicon etching system 螺旋波蚀刻系统
- immersion wet etching system 浸渍式蚀刻系统
- ion beam etching system 离子束蚀刻系统
- photo excited etching system 光激励蚀刻系统
- plasma etching system 等离子体蚀刻系统
- reactive sputter etching system 反应性溅镀蚀刻系统
- spray etching system 喷涂式蚀刻系统
- wet etching system 湿式蚀刻系统
- barrel type plasma etching system 圆筒型等离子体蚀刻系统
- down stream plasma etching system 分离型等离子体蚀刻系统
- narrow gareactive ion etching system 狭窄间隙反应性离子蚀刻系统
- triode reactive ion etching system 三极型反应性离子蚀刻系统
- hexode type reactive ion etching system 六角柱型反应性离子蚀刻系统
- etching n. 1.蚀刻法；蚀刻(铜)版画；蚀镂术。 2.蚀刻画，蚀刻版，蚀刻版印刷品。 close [rough] etching (晶体的)精[粗]蚀。 electrochemical etching 电化浸蚀，电抛光。
- acid etching 酸蚀处理; 酸蚀刻; 酸性浸蚀
- after etching 残余腐蚀; 后腐蚀; 后侵蚀
- alkaline etching 碱腐蚀法; 碱侵蚀
- anisotropic etching 蛤异性腐蚀; 各向异性刻蚀; 各向异性蚀刻，非等向性蚀刻
- anode etching 阳极电解腐蚀
- Overflow cup etching system
溢流杯蚀刻系统 - Plasma etching system
等离子体蚀刻系统 - Ion beam etching system
离子束蚀刻系统 - Wet etching system
湿式蚀刻系统 - All these has provided us with scientific basis for designing the chamber of icp etching system and selecting the appropriate etching samples
这些结论为设计icp刻蚀系统的反应室、选择合适的刻蚀工艺提供了科学的根据。 - It is not possible to have the old and new versions of zope plone installed together on an etch system , partly because the old packages depend on
不可能在etch系统上同时将旧版和新版的zope plone安装在一起，部份原因是因为旧版的套件相依于 - Please note that the new mechanism means that if you e . g . exchange ethernet adapters in a running etch system , the new adapter will also get a new interface name
请注意到，新的机制也代表了如果您像是置换了正在运作中的etch系统上的网路卡，新的网路卡将会拿到一个新的介面名称。 - A set of icp etching system has been designed and manufactured through the analysis of the probe diagnosed results . during the study of the system , the emphasis is laid on the matching problem of icp coupled antenna via the rf matching device and rf power source
通过对探针诊断结果的分析，设计并制作一套icp刻蚀系统，重点研究icp耦合天线通过射频匹配器与射频功率源的匹配问题，得到很好的匹配效果，在射频输出功率为500w以内时，反射功率小于10w 。 - When the output power of the rf is within 500w and the reflection power is within 10w , a good matching effect can be gained . insb - in material in the icp etching system is etched by chc1f2 plasma . through the sem analysis of the etching result , it can be observed that the sidewall is smooth , flat and anisotropic
在自制的icp干法刻蚀系统中用chclf _ 2等离子体对insb - in材料实现了干法刻蚀，通过对刻蚀样品的sem分析，观察到刻蚀后的侧壁光滑平整，有良好的各向异性。
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Last modified time:Sun, 17 Aug 2025 00:29:56 GMT
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